Технология обработки поверхности

In semiconductor manufacturing, surface treatment technology plays a crucial role in enhancing the durability, performance, and reliability of components by modifying their surface properties through advanced coating and deposition methods.

Physical Vapor Deposition (PVD)

Physical Vapor Deposition PVD is a vacuum-based coating process that deposits thin films onto substrates through vaporization of solid materials. It enhances surface hardness, thermal resistance, and conductivity, making it essential for semiconductor tools and precision components.

Semiconductor Thermal Spraying Technology

This technique involves high-temperature spraying of fine powders onto surfaces to create dense, protective coatings. It significantly boosts resistance to heat, wear, and corrosion in critical semiconductor components exposed to harsh environments.

MAX Phase Nanopowder

MAX Phase nanopowders are layered ceramics with metallic properties, offering high strength, conductivity, and thermal shock resistance. They are ideal for protective coatings and emerging semiconductor applications requiring high-temperature stability.